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BARCs|CMP|developer|photoresist|strippers
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Bottom antireflective coatings (BARCs) are organic-based
materials that eliminate reflective notchings and significantly
reduce line width variations caused by photoresist film thickness
changes over topography on a wafer. This product is offered for
i-line, deep-UV, and 193-nm technologies.  |
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1.DARC-K30  |
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DARC-K30 is a bottom antireflective coating that corresponds
to photofabrication using a KrF photoresist.  |
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- Good Conformality
- Wide Process Margin  |
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2.DARC-K40  |
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DARC-K40 is a bottom antireflective coating that corresponds
to photofabrication using a low thickness KrF photoresist.  |
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- High Etch Rate
- Wide Process Margin  |
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3.DARC-A20  |
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DARC-A20 is a bottom antireflective coating that corresponds
to photofabrication using a ArF photoresist of acrylate type.
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- Good Conformality
- High Etch Rate
- Wide Process Margin  |
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4.DARC-A40  |
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DARC-A40 is bottom antireflective coating that corresponds
to photofabrication using a ArF photoresist of COMA and hybrid types.
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- Good Conformality
- High Etch Rate
- Wide Process Margin  |

SEMICONDUCTOR TOPへ
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